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By H. Fischer (auth.), H. Fischer (eds.)

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0 2 - products m React. of n-(C,H,)Sn. with parent bromide KESR hydrocarbon Ad ’ 0 2 78Brul Ad - products Ad = 1-adamantyl ‘Q Ad React, of (CH,),Sn . CH=CHOH products Pulse rad. of an N,O satd. soln. 103M-tcm-’ +-+ products due to bimolecular decay 2(CH,),SiC=C(Si(CH,),)SiCI, React. 1 Griller 75Gri2 s (CH,),SiC=C(Si(CH,),)CCI, ft-, products due to bimolecular decay React. of trichloromethyl radicals with bis(trimethylsilyl)acetylene persistent 298 KESR DTBP *I) Radical decays by attack at (wC,H,),Sn,.

0. 2. lo7 Ref. p. / add. ref. 3 Six-membered rings a 2 /O HNI”x - products 04 -N-H React. 103M-1cm-1 ‘) 0 2 HN l 0 R H - products R=Cl 4 L% N H Pulse rad. of soln. 6(12)~10gM-1s-’ 1=325nm; ~=1300M-~s-~ products Pulse rad. of soln. 10gM-‘s-’ 1=240nm; s=3500M-‘cm-’ 2 NHCHCONHCH,CO - 72Hay2 products Pulse rad. of soln. 10gM-‘s-’ 1=240nm; s=3000M-l cm-’ 3, 5-fluorouracil. 75Wagl 4, 5-chlorouracil. 5-bromouracil. 4 Cycloalkyl radicals [Ref. p. / Solvent TWI 2 6;) products H-atom add. to uracil KAS H,O, pH = 5 Rate data add.

Cleavage,using Na/K alloy of the oxalic acid diester of the corresp. alcohol KESR persistent 293 w, rljZ =2min 79Sch2 2 ((CH,),Si)((CH,),C)CCH(Si(CH,),), + products due to bimolecular self-reaction React. 3 Tertiary alkyl radicals 7-M ;; 2 CeF,--C-c-(C(CH,),), products Phot. of ((CH,),C),CCO + C,F,I + (CH,),Sn, SESR 223 c-CSHlO Rate data [Ref. p. / add. ref. 78Mall persistent r,,,>hours 2((CH,),C),&H,C,H, + products due to bimolecular decay React. 7. lo3 s 74Men 1 2 ((CH,),CCH,),c products Reductive cleavage of the oxalic acid diester of the corrcsp.

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